| 摘要 |
A method is described that involves measuring a first set of interferometer fringe line disturbances against pre-determined measurement scale information in order to generate a first set of profiles that describe the topography of a sample that is placed upon a sample stage associated with the interferometer. The first set of profiles map to traces that run over a first axis of the sample and the sample stage. The traces have a recognized spacing between one another along a second axis of the sample and the sample stage. The method also involves adjusting the relative position of the traces to the sample so as to create a second set of fringe line disturbances. The method also involves measuring, the second set of interferometer fringe line disturbances against the pre-determined measurement scale information in order to generate a second set of profiles that describe the topography of the sample. The method also involves interleaving the first set of profiles and the second set of profiles to create a topography description of the sample that has a resolution along the second axis that is smaller than the spacing.
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