发明名称 |
Porous siliceous film having low permittivity, semiconductor devices and coating composition |
摘要 |
There is provided a porous silica coating, suitable for an interlayer dielectric, which stably exhibits an extremely low specific dielectric constant and which also has resistance to various chemicals and a mechanical strength allowing the coating to withstand the latest highly integrating process including a CMP process. The porous coating of the present invention is obtained by baking a coating of a composition comprising a polyalkylsilazane and a polyacrylic or polymethacrylic ester, and is characterized by having a specific dielectric constant of less than 2.5.
|
申请公布号 |
US2004028828(A1) |
申请公布日期 |
2004.02.12 |
申请号 |
US20030363007 |
申请日期 |
2003.02.26 |
申请人 |
AOKI TOMOKO;SHIMIZU YASUO |
发明人 |
AOKI TOMOKO;SHIMIZU YASUO |
分类号 |
C08L33/06;C08L83/16;C09D1/00;C09D133/06;C09D183/16;H01L21/316;H01L21/768;(IPC1-7):B05D3/02;H01L23/48 |
主分类号 |
C08L33/06 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|