发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a bipolar transistor integrated circuit device of proper characteristics and a small element area. SOLUTION: The bipolar transistor, having a small collector resistance and a small element area, can be formed by utilizing a trench structure in the formation of the region called a sinker. It is effective in a BiCMOS, where a vertical field-effect transistor exists on the same substrate. These processes can be realized, without the addition of many steps to the conventional processes. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004047548(A) 申请公布日期 2004.02.12
申请号 JP20020200063 申请日期 2002.07.09
申请人 SEIKO INSTRUMENTS INC 发明人 SAITO NAOTO
分类号 H01L21/331;H01L21/22;H01L21/8222;H01L21/8248;H01L21/8249;H01L27/04;H01L27/06;H01L29/732;H01L29/78;(IPC1-7):H01L21/331;H01L21/822;H01L21/824 主分类号 H01L21/331
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