| 发明名称 |
Photoresist systems |
| 摘要 |
New photoresist systems are provided that comprise an underlying processing (or barrier) layer composition and an overcoated photoresist layer. Systems of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.
|
| 申请公布号 |
US2004029042(A1) |
申请公布日期 |
2004.02.12 |
| 申请号 |
US20030412640 |
申请日期 |
2003.04.11 |
| 申请人 |
TAYLOR GARY N.;XU CHENG-BAI |
发明人 |
TAYLOR GARY N.;XU CHENG-BAI |
| 分类号 |
G03F7/105;(IPC1-7):G03F7/075;G03F7/11;G21K5/00;G03F7/20;G03F7/40 |
主分类号 |
G03F7/105 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
