METHOD OF FABRICATING LIQUID CRYSTAL DISPLAY

摘要

PURPOSE: A method of fabricating a liquid crystal display is provided to reduce the number of photolithography processes to simplify the entire fabrication process. CONSTITUTION: The first metal layer is formed on a substrate(200) and etched through the first photolithography process to form a common gate electrode(100). An insulating layer(202) and an amorphous silicon layer are sequentially formed on the substrate including the common gate electrode. The amorphous silicon layer is etched through the second photolithography to form an active layer(204) and a counter electrode(205). The second metal layer is formed on the substrate and etched through the third photolithography process to form source and drain electrodes(206a,206b). Heat treatment is carried out to respectively form metal silicide films(208) on the source and drain electrodes and counter electrode. A passivation layer is formed on the overall surface of the substrate and etched through the fourth photolithography process to form an opening that exposes the drain electrode. A transparent metal layer is formed on the substrate and etched through the fifth photolithography process to form a pixel electrode(223) that is connected to the drain electrode through the opening.