发明名称 |
RADIATION SENSITIVE RESIN COMPOSITION |
摘要 |
PURPOSE: To provide a radiation sensitive resin composition having high sensitivity, a high rate of a developed residual film and high solvent resistance and ensuring high productivity. CONSTITUTION: In the radiation sensitive resin composition comprising (A) an alkali-soluble resin, (B) a radiation sensitive compound and (C) a solvent, >=16 mass% of the solvent is α-hydroxyisobutanoic esters.
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申请公布号 |
KR20040012452(A) |
申请公布日期 |
2004.02.11 |
申请号 |
KR20030030476 |
申请日期 |
2003.05.14 |
申请人 |
SUMITOMO CHEMICAL CO., LTD. |
发明人 |
YAKO YUKO;SHIRAKAWA MASAKAZU |
分类号 |
G03F7/004;C08F220/26;G03F7/022;G03F7/027;G03F7/11;G03F7/40;(IPC1-7):G03F7/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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