发明名称 RADIATION SENSITIVE RESIN COMPOSITION
摘要 PURPOSE: To provide a radiation sensitive resin composition having high sensitivity, a high rate of a developed residual film and high solvent resistance and ensuring high productivity. CONSTITUTION: In the radiation sensitive resin composition comprising (A) an alkali-soluble resin, (B) a radiation sensitive compound and (C) a solvent, >=16 mass% of the solvent is α-hydroxyisobutanoic esters.
申请公布号 KR20040012452(A) 申请公布日期 2004.02.11
申请号 KR20030030476 申请日期 2003.05.14
申请人 SUMITOMO CHEMICAL CO., LTD. 发明人 YAKO YUKO;SHIRAKAWA MASAKAZU
分类号 G03F7/004;C08F220/26;G03F7/022;G03F7/027;G03F7/11;G03F7/40;(IPC1-7):G03F7/027 主分类号 G03F7/004
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