发明名称 WAFER CENTERING METHOD OF SEMICONDUCTOR FABRICATING APPARATUS USING JIG WAFER
摘要 PURPOSE: A wafer centering method of a semiconductor fabricating apparatus using a jig wafer is provided to reduce variation of an interval of wafer centering time of each semiconductor fabricating apparatus and absolutely decrease the interval of the wafer centering time by aligning the jig wafer with a pedestal by one wafer alignment process. CONSTITUTION: The jig wafer is loaded into a position over the pedestal by using a handler of a cassette(S1). The variation distance between the centers of the jig wafer and the pedestal is measured(S2). The centers of the jig wafer and the pedestal are aligned according to the variation distance(S3).
申请公布号 KR20040011994(A) 申请公布日期 2004.02.11
申请号 KR20020045331 申请日期 2002.07.31
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, JEONG HO;LIM, TAE SEOP;PARK, JANG JU;YOON, JAE IM
分类号 H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/68
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