| 摘要 |
PURPOSE: An exposure device is provided to bring a photomask into uniform contact with the entire surface of a substrate through easy operation without using any spacer. Further, an exposure method using such exposure device is also provided. CONSTITUTION: The exposure device includes a substrate support base(12); a ring-shaped hollow seal member(13) which extends surrounding the circumference of the substrate(11) and on which a patterned photomask(26) is mounted; and a control unit(22) for determining and supplying the proper value of pressure to be applied to a 1st space(27) and a 2nd space(28) according to the inputted information regarding the size of the substrate(11) so that the photomask(26) comes into uniform contact with the entire surface of the substrate(11). The 1st space(27) is formed by being surrounded with the substrate support base(12), the seal member(13), the substrate(11) and the photomask(26) and the 2nd space(28) is formed in the inside of the hollow seal member(13).
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