发明名称 |
Laser processing method |
摘要 |
In an annealing process of illuminating a semiconductor thin film with laser light, in the case where the laser illumination is performed at an energy level that is lower than an output energy range that allows a laser apparatus to operate most stably, the laser output is fixed somewhere in the above output energy range and the illumination energy is changed by inserting or removing a light attenuation filter into or from the laser illumination optical path. As a result, the time required for the laser processing can be shortened.
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申请公布号 |
US6689651(B2) |
申请公布日期 |
2004.02.10 |
申请号 |
US20010946381 |
申请日期 |
2001.09.06 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
ZHANG HONGYONG;TANAKA KOICHIRO |
分类号 |
H01L21/02;B23K26/06;B23K26/073;H01L21/20;H01L21/268;(IPC1-7):H01L21/268 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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