发明名称 Laser processing method
摘要 In an annealing process of illuminating a semiconductor thin film with laser light, in the case where the laser illumination is performed at an energy level that is lower than an output energy range that allows a laser apparatus to operate most stably, the laser output is fixed somewhere in the above output energy range and the illumination energy is changed by inserting or removing a light attenuation filter into or from the laser illumination optical path. As a result, the time required for the laser processing can be shortened.
申请公布号 US6689651(B2) 申请公布日期 2004.02.10
申请号 US20010946381 申请日期 2001.09.06
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 ZHANG HONGYONG;TANAKA KOICHIRO
分类号 H01L21/02;B23K26/06;B23K26/073;H01L21/20;H01L21/268;(IPC1-7):H01L21/268 主分类号 H01L21/02
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