发明名称 CAPACITIVE ELEMENT AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To prevent deterioration in the polarization characteristic of a ferroelectrics film or a high dielectrics film constituting a capacitor insulating film even when heat treatment in a reducing atmosphere is applied to a ferroelectrics capacitor. SOLUTION: A capacitive element is formed on the surface of an inter-layer insulating film 101 formed on a semiconductor substrate 100. The capacitive element is constituted of a laminated body comprising a lower electrode 102 formed of platinum, a capacitive insulating film 103 composed of SBT (SrTaBiO) containing an element, e.g. titanium, for absorbing hydrogen in crystal grain boundaries, inter-grating positions or pores and an upper electrode 104 formed of platinum. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004040005(A) 申请公布日期 2004.02.05
申请号 JP20020198125 申请日期 2002.07.08
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MIKAWA TAKUMI;SOSHIRO YUUJI;HAYASHI SHINICHIRO
分类号 H01L21/316;H01L21/02;H01L21/8246;H01L27/105;H01L27/108;(IPC1-7):H01L27/105 主分类号 H01L21/316
代理机构 代理人
主权项
地址
您可能感兴趣的专利