| 摘要 |
PROBLEM TO BE SOLVED: To provide a metal mask capable of forming a precise pattern film as a metal mask for vapor deposition for an organic EL display or the like. SOLUTION: The metal mask has a plurality of through-holes and is made up of a plurality of layers of metal. The metal mask comprises an opening formation layer for defining opening dimensions, a supporting layer, and an intermediate layer disposed in between. At least one of the opening defining layer, the supporting layer and the intermediate layer is a metal mask having different etching characteristics from those of the remaining layers. Preferably, the intermediate layer is composed of a dry-type deposition layer and is the metal film having different etching characteristics from those of the opening formation layer and the support layer. COPYRIGHT: (C)2004,JPO
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