| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alkali-soluble resin constituting the main component of a radiation-sensitive resin composition which can form a resist film excellent in heat resistance, sensitivity and developing properties as well as in a residual film ratio and also excellent in chemical resistance, adhesion to a substrate and transparency in the visible light region. <P>SOLUTION: The alkali-soluble resin is obtained by reacting at least one polybasic carboxylic acid or an anhydride thereof with an epoxy ester compound formed from an epoxy compound having a specific bisphenol fluorene structure and an alicylic or aromatic monobasic carboxylic acid. <P>COPYRIGHT: (C)2004,JPO |
