发明名称 TREATMENT APPARATUS AND METHOD FOR RELEASING ELECTROSTATIC CHUCK
摘要 PROBLEM TO BE SOLVED: To provide a technique which can prevent the occurrence of an abnormal release when a material to be treated (material to be attracted) is released from an electrostatic chuck and which can shorten a time required for the release. SOLUTION: A method for releasing an electrostatic chuck includes steps of supplying charge of a reverse polarity to charge generated on the rear surface of the material W to be treated, electrostatically attracted to a placing base 4 for electrostatically attracting the material W by applying a voltage to a chuck electrode 46, and releasing the material from the base 4. In this case, since the charge generated on the rear surface of the material W in which the charge is rapidly moved around is rapidly cancelled, the suitable timing of releasing the material W can be created, and hence the abnormal release of the material W can be suppressed. Since destaticizing is smoothly conducted, high throughput can be maintained. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004040046(A) 申请公布日期 2004.02.05
申请号 JP20020198721 申请日期 2002.07.08
申请人 TOKYO ELECTRON LTD 发明人 NISHIMOTO SHINYA
分类号 H01L21/3065;H01L21/68;H01L21/683;H02N13/00;(IPC1-7):H01L21/68;H01L21/306 主分类号 H01L21/3065
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