发明名称 |
Processing apparatus, measuring apparatus, and device manufacturing method |
摘要 |
A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
|
申请公布号 |
US2004022694(A1) |
申请公布日期 |
2004.02.05 |
申请号 |
US20030619506 |
申请日期 |
2003.07.16 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
HARA SHINICHI;TANAKA YUTAKA;TERASHIMA SHIGERU;HASEGAWA TAKAYUKI;MATSUI SHIN |
分类号 |
H01L21/027;G03F7/20;G05D16/00;G05D16/20;(IPC1-7):G05D16/00;G05D23/00;H01L21/30 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|