| 摘要 |
Phase shift mask which is a single side engraving type phase shift mask, which comprises a shifter part and a non-shifter part adjacent mutually on a substrate, and a shading layer pattern formed with a shading film which covers continuously from the end of the shifter part to the adjacent end of the non-shifter part including the side wall part of a dug-down part for forming said shifter part, and wherein the side wall part inclines so that the side wall part spreads toward the substrate surface.
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