发明名称 METHOD AND APPARATUS FOR INSPECTING DEFECT
摘要 PROBLEM TO BE SOLVED: To measure local electric characteristics of a device having a fine structure for detecting a defect. SOLUTION: While observing with a scanning electron microscope, a plurality of probes 1, 2, 3 and 4 each having a sharp tip are made to approach sample electrodes 5, 6, 7 and 8, respectively, and made to come into contact with them completely until a contact current saturates by the use of probe moving mechanisms 14, 15, 16 and 17 under the control of a probe movement control circuit 18. After all of the probes used for measurement are made to come into contact with them, the current-voltage characteristics between probes are measured by the use of an electric characteristic measuring circuit 19 and thus the local electric characteristics of an element are obtained. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004040132(A) 申请公布日期 2004.02.05
申请号 JP20030334551 申请日期 2003.09.26
申请人 HITACHI LTD 发明人 TOMIMATSU SATOSHI;HASEGAWA TAKESHI;HOSOKI SHIGEYUKI;ARAKAWA FUMIKO;ASAYAMA MASAICHIRO;MITSUI YASUHIRO;NAKAHARA HITOSHI;KAWANAMI YOSHIMI
分类号 G01R31/302;G01R31/28;H01J37/244;H01J37/28;H01L21/66;(IPC1-7):H01L21/66 主分类号 G01R31/302
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