| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate inspection method and apparatus in which the erroneous determination of a foreign material or a defect is sufficiently prevented. SOLUTION: In a step S1, a wafer W is loaded on a particle monitor, and a step S2 is carried out to create an inspection recipe. In the step S2, the setting of a basic parameter, a location calibration, the sensitivity adjustment of a detector and the description of location information are successively implemented. Thereafter, based upon background fluctuation on the surface of the wafer W, a threshold RSj dynamically allocated to each of a plurality of virtual areas in an inspection portion on the wafer W is determined. Then, the particle inspection of the wafer W is performed by using the threshold RSj. COPYRIGHT: (C)2004,JPO
|
