| 摘要 |
PROBLEM TO BE SOLVED: To provide an aperture means suitable for a charged particle beam pattern writing system having a blanking aperture array. SOLUTION: An aperture array (20) is arranged in a pattern writing region composed of a plurality of alternating lines wherein each line is composed of a first segment (sf) having no aperture, and second segments (r1, r2, r3) each including a large number of apertures separated by an aperture region as lateral offset. The lateral offset is equal to integer times of the aperture width and the length of the first segment is set longer than the lateral offset. It is repeated every n-th (n≥2) line in the direction perpendicular to the line direction. COPYRIGHT: (C)2004,JPO
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