| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a microwave plasma treatment device which prevents discharge in a gas introducing path for plasma excitation. <P>SOLUTION: The plasma treatment device for treating a substrate to be treated has such an arrangement that a space for plasma excitation and the plasma gas introducing path are separated from each other by a porous medium, for example, a porous ceramic material. Such an arrangement prevents plasma excitation in the plasma introducing path so that homogeneous plasma of high density can be excited in a desired plasma excitation space. <P>COPYRIGHT: (C)2004,JPO |
