发明名称 Production of photoresist coatings
摘要 Process for the production of a resist coating, in which(a) a substrate is coated with a resist composition which comprises at least one component which absorbs radiation in the near infrared region with warming of the coating; and(b) the resist composition or a composition derived therefrom and obtained during the process is subjected at least once during the process to thermal treatment with the aid of radiation in the near infrared region.
申请公布号 US6686122(B1) 申请公布日期 2004.02.03
申请号 US20010868817 申请日期 2001.06.21
申请人 VANTICO INC. 发明人 SETIABUDI FRANS
分类号 G03F7/16;G03F7/38;G03F7/40;H05K3/00;H05K3/28;H05K3/46;(IPC1-7):G03F7/00 主分类号 G03F7/16
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