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发明名称
CONTROL OF A GASEOUS ENVIRONMENT IN A WAFER LOADING CHAMBER
摘要
申请公布号
AU2003249029(A1)
申请公布日期
2004.02.02
申请号
AU20030249029
申请日期
2003.07.10
申请人
ASML US, INC.
发明人
ALAN STARNER
分类号
H01L21/22;C23C16/44;C23C16/455;C23C16/46;C23C16/54;F27B5/14;F27B5/18;F27D11/02;H01L21/00;H01L21/02;H01L21/205;H01L21/324;H01L21/677;H05B3/00;H05B3/06;H05B3/66
主分类号
H01L21/22
代理机构
代理人
主权项
地址
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