DIFFERENTIAL PRESSURE TYPE FLOW CONTROLLER FOR GASES USED IN SEMICONDUCTOR PROCESS

摘要

PURPOSE: A differential pressure flow controller for gases used in a semiconductor process is provided to control accurately the flow of the gas by using a differential generation element for generating the differential pressure of the semiconductor process gas. CONSTITUTION: A body(10) includes a flow path of gases in a semiconductor process. A control valve(20) is used for controlling the flow of the gases by opening or shutting the flow path of the body. A differential pressure generation element(30) is used for generating the differential pressure from the flow path of the body. A bypass(40) is used for connecting an upper part to a lower part of the flow path. A pressure sensor(50) is installed at the bypass in order to detect the differential pressure of the flow path. A CPU(Central Processing Unit)(60) produces the flow of the gases and controls the control valve according to a detection signal of the pressure sensor.