METHOD FOR FORMING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A method for fabricating a semiconductor device is provided to prevent the induction of sidelobe due to the reiteration of exposure energy by performing a multiple exposure process using two or more exposure masks in an exposure process. CONSTITUTION: Two or more exposure masks are separately designed to prevent the reiteration of exposure energy in an exposure process. The exposure processes are performed two or more times by using the exposure masks. A fine pattern is formed on a semiconductor substrate by performing the exposure processes, two or more times. The fine pattern is formed with one of a contact hole, an island pattern, and a line. The exposure mask includes an OPC part and a non-OPC part. The exposure mask is a PSM mask or a binary mask.