发明名称 LIGHT GENERATION APPARATUS, EXPOSURE APPARATUS, AND MANUFACTURING METHOD OF DEVICE
摘要 PROBLEM TO BE SOLVED: To widely change intensity of light generated by a light generation apparatus. SOLUTION: This light generation apparatus includes an X-ray source 10, a high-voltage generation circuit 20, a CPU 40 and the like. The generation circuit 20 has a plurality of capacitors C1-C3 and a plurality of switches S1-S6 arranged in charge paths and discharge paths of the capacitors. The capacitors for supplying electric energy to the X-ray source 10 are changed over by controlling the switches by the CPU 40, and thereby the electric energy supplied to the X-ray source 10 is changed. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004031024(A) 申请公布日期 2004.01.29
申请号 JP20020183377 申请日期 2002.06.24
申请人 CANON INC 发明人 KITAOKA ATSUSHI
分类号 G21K5/00;G03F7/20;G21K5/02;H01L21/027;H05B37/00;H05G1/24;H05G2/00;(IPC1-7):H05G2/00 主分类号 G21K5/00
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