发明名称 LIGHT IRRADIATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a light irradiation method capable of coping with extensive qualification, which increases remarkably productivity of equipment for modifying material by irradiating a wide area with light of superior controlability, and can reduce cost. SOLUTION: In the light irradiation method, by using light irradiation equipment in which a light source performing pulse lighting is arranged, light irradiation is performed to an object to be irradiated which is composed of the object amorphous silicon and/or polycrystalline silicon, by controlling irradiation indicia S defined by S=E/τ<SP>1/2</SP>where light energy E is shown by J/cm<SP>2</SP>and pulse widthτis given in sec. A value of the irradiation indicia S is in a range of 250≤S≤700. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004031643(A) 申请公布日期 2004.01.29
申请号 JP20020185838 申请日期 2002.06.26
申请人 USHIO INC 发明人 KARASAWA TAKESHI;IKEUCHI MITSURU
分类号 H01L21/20;H01L21/26;(IPC1-7):H01L21/20 主分类号 H01L21/20
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