| 摘要 |
A system and method for testing the resistance of a test wafer that comprises multiple conductors, the method includes the steps of: (i) Providing a signal that is substantially larger than a signal threshold to a test structure; and (ii) Scanning at least a two conductors of the test structure, by a limited voltage resolution SEM, said at least two conductors are electrically coupled to each other, and collecting charged particles emitted from the at least two conductors as a result of the scanning, thus providing an indication about a resistance of the at least two conductors.
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