发明名称 Laser exposing apparatus
摘要 A laser exposing apparatus has a first laser source emitting a first laser beam, a second laser source emitting a second laser beam shorter in wavelength than the first laser beam, and an optical device for directing the first laser beam and the second laser beam to a photosensitive member. The second laser beam has a longer optical path length to the photosensitive member than the first laser beam.
申请公布号 US2004017468(A1) 申请公布日期 2004.01.29
申请号 US20030621417 申请日期 2003.07.18
申请人 CANON KABUSHIKI KAISHA 发明人 MOTOYAMA HAJIME
分类号 B41J2/44;B41J2/47;G02B26/10;G02B26/12;H04N1/113;(IPC1-7):B41J2/45 主分类号 B41J2/44
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