| 摘要 |
A method of fabricating a liquid crystal display device, includes forming a gate electrode and a gate pad over a substrate; forming a gate insulating film over the substrate; forming a semiconductor layer over the gate insulating film; forming a source electrode, a drain electrode and a data pad over the gate insulating film; depositing an inorganic insulating material on the gate insulating film; depositing an organic insulating material over the inorganic insulating material; removing selectively the organic insulating material at a partial area over the drain electrode, the gate pad and the data pad, to leave a portion of the organic insulating material over the gate pad and the data pad; patterning the gate insulating film and the inorganic insulating material using at least a portion of the remaining organic insulating material as a mask, thereby providing an inorganic protective film, an organic protective film, a drain contact hole, a gate contact hole and a data contact hole; and forming a pixel electrode on the inorganic protective film by depositing a transparent conductive film onto the inorganic protective film and the organic protective film and patterning the transparent conductive film, and forming a gate protective electrode and a data protective electrode on the inorganic protective film. |
