发明名称 Semiconductor device with alternating conductivity type layer and method of manufacturing the same
摘要 A semiconductor device having an alternating conductivity type layer improves the tradeoff between the on-resistance and the breakdown voltage and facilitates increasing the current capacity by reducing the on- resistance while maintaining a high breakdown voltage. The semiconductor device includes a semiconductive substrate region, through which a current flows in the ON-state of the device and that is depleted in the OFF-state. The semiconductive substrate region includes a plurality of vertical alignments of n-type buried regions 32 and a plurality of vertical alignments of p-type buried regions. The vertically aligned n-type buried regions and the vertically aligned p-type buried regions are alternately arranged horizontally. The n-type buried regions and p-type buried regions are formed by diffusing respective impurities into highly resistive n-type layers 32a laminated one by one epitaxially.
申请公布号 US6683347(B1) 申请公布日期 2004.01.27
申请号 US19990348915 申请日期 1999.07.07
申请人 FUJI ELECTRIC CO., LTD. 发明人 FUJIHIRA TATSUHIKO
分类号 H01L21/331;H01L21/336;H01L29/06;H01L29/739;H01L29/78;H01L29/861;H01L29/872;(IPC1-7):H01L29/76;H01L21/00 主分类号 H01L21/331
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