发明名称 Method for a plan-view transmission electron microscopy sample preparation technique for via and contact characterization
摘要 A method for preparing a transmission electron microscopy (TEM) sample for contact and via characterization. Specifically, one embodiment of the present invention discloses a method where an integrated circuit semiconductor chip (IC chip) is bonded to a piece of glass and attached to a sample holder. Areas of the IC chip are removed by polishing until a region surrounding a particular contact or via is exposed. The piece of glass supports the IC chip during the polishing process. The IC chip is cut using a focused ion beam to create a thin membrane suitable for TEM failure analysis. The thin membrane includes a plan-view cross-section from the particular contact or via. The cross-sectional plan-view is perpendicular to the longitudinal axis of the contact or via.
申请公布号 US6683304(B1) 申请公布日期 2004.01.27
申请号 US20020192751 申请日期 2002.07.08
申请人 CHARTERED SEMICONDUCTOR MANUFACTURING LIMITED 发明人 JIYAN DAI;FOONG TEE SIAM;LAM TAI CHUI;ER EDDIE;REDKAR SHAILESH
分类号 G01N1/28;(IPC1-7):G01N23/00;G21K7/00 主分类号 G01N1/28
代理机构 代理人
主权项
地址
您可能感兴趣的专利