CLEANING LIQUID FOR REMOVING RESIST AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE

摘要

PURPOSE: A cleaning liquid for removing resist and a manufacturing method for a semiconductor device using the cleaning liquid are provided to enhance removing function of resist residual dross and resistance against corrosion of a copper film and an insulator film. CONSTITUTION: A cleaning liquid for removing a resist contains salt of hydrofluoric acid and base which does not contain metal, a water-soluble organic solvent, one or more acid, and water. The acid is one selected from a group consisting of organic acid and inorganic acid. Hydrogen ion concentration(pH) of the cleaning liquid is 4 to 8. Preferably, the cleaning liquid contains additionally ammonium salt.