| 摘要 |
PURPOSE: To obtain exposure conditions of every exposure device corresponding to an individual difference without complicated work for confirming exposure conditions. CONSTITUTION: In a database 10 included in an exposure condition determining system 100, the information of a exposure process performed in the past is accumulated, and mask information 11, exposure device information 12, resist process information 13, and exposure condition information 14 in the past, are included. An exposure condition determining section 15 determines exposure conditions suited for a new mask, based on the wide variety of information abstracted from the database 10 and new mask information 20 using an exposure condition determining program, and outputs a result to be new mask exposure conditions 21. A simulation section 16 performs optical simulation or development simulation based on the wide variety of information abstracted from the database 10 and the new mask information 20. The result simulated by the simulation section 16 is used when the new mask exposure conditions 21 are determined at the exposure condition determining section 15.
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