| 摘要 |
<p>An antireflective organic coating composition comprises a crosslinking agent, a light absorbing agent, a thermally activated acid generator, an organic solvent and a polydimethylsiloxane polymer. Independent claims are also included for: (1) a method of forming a photoresist by applying the claimed composition onto the surface of a layer intended to be attacked, heat treating the resulting material to generate crosslinks and form an anti-reflective organic film, applying a coating of photoresist onto the anti-reflective film, exposing to a source of light and developing; and (2) a semiconductor device fabricated using the claimed method.</p> |
