| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
A controlled aperture provides an opening through a barrier separating two parts of the apparatus to enable a pulse of radiation to be radiated from one part of the apparatus to the a second part. The controlled aperture closes the opening between the pulses of radiation to minimize the gas flow between the first and second parts.
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| 申请公布号 |
US2004013226(A1) |
申请公布日期 |
2004.01.22 |
| 申请号 |
US20030396693 |
申请日期 |
2003.03.26 |
| 申请人 |
ASML NETHERLANDS, B.V. |
发明人 |
BAKKER LEVINUS PIETER;JONKERS JEROEN;VAN DIJSSELDONK ANTONIUS JOHANNES JOSEPHUS;MARIE DIERICHS MARCEL MATHIJS THEODORE |
| 分类号 |
G21K1/04;G03F7/20;G21K5/00;G21K5/02;H01L21/027;H05G2/00;(IPC1-7):G21K5/00 |
主分类号 |
G21K1/04 |
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