| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material which has high development activity, is less likely to cause fog, and is less dependent on ambient temperature and humidity. SOLUTION: The heat developable photosensitive material comprising photosensitive silver halide, a reducing agent for a silver ion, binder, and non-photosensitive organic silver salt contains a compound expressed by the general formula shown by chemical formula 1 and a thermal solvent having a fusing point between 50°C and 200°C inclusive. In chemical formula 1, Z<SB>1</SB>and Z<SB>2</SB>each represent a halogen atom, X<SB>1</SB>represents a hydrogen atom or an electron withdrawing radical, Y<SB>1</SB>represents -CO- radical or a -SO<SB>2</SB>- radical, Q represents an arylene radical or a bivalent heterocyclic ring radical, L represents a linking radical, W<SB>1</SB>and W<SB>2</SB>each represent a hydrogen atom, alkyl radical, aryl radical, or heterocyclic ring radical, and n represents 0 or 1. COPYRIGHT: (C)2004,JPO
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