METHOD OF FORMING FILM AND FILM FORMING APPARATUS

摘要

A method of forming a metal oxide film from an organometallic compound as a raw material, characterized in that it comprises the steps of feeding activated oxygen gas through a first flow channel to a treating container and simultaneously with this step or after or during the step, feeding an organometallic gas through a second flow channel to the treating container. Thus, the content of impurities such as residual carbon can be lowered, thereby enabling obtaining a metal oxide film of high quality.