METHOD, DEVICE AND PROGRAM FOR INSPECTING EXPOSURE DEVIATION AND COMPUTER READABLE RECORDING MEDIUM RECORDING EXPOSURE DEVIATION INSPECTION PROGRAM

摘要

PROBLEM TO BE SOLVED: To perform highly accurate exposure overlap inspection on the limited number of measuring points. SOLUTION: The exposure deviation inspecting method is provided with a step (step S1) for acquiring n points (n is a natural number) per one shot area about distortion matching data due to a difference between an exposure condition of 1st exposure and an exposure condition of 2nd exposure, a step (step S2) for acquiring m points (m is a natural number smaller than n) per one shot area about a positional deviation of patterns obtained after applying 1st exposure and 2nd exposure to a substrate to be inspected, a step (step S3) for finding the deviation quantity of a linear component from the positional deviation quantity of m points, and a step (step S4) for calculating positional deviation quantity obtained when respective positions corresponding to the n points of the one-shot area of the substrate to be inspected are exposed from the distortion matching data of the n points and the deviation quantity of the linear component. COPYRIGHT: (C)2004,JPO