| 摘要 |
<p>An object of the present invention is to provide an apparatus for removing particles which effectively eliminates particles in the vacuum container unit without degrading the rate of operation of the processing device, and is simple and inexpensive to embody. <??>The apparatus for removing particles in accordance with the present invention is for a processing device including a vacuum container unit having a plurality of chambers in which a predetermined process is performed on a wafer carried in by a conveyer unit in atmosphere. The apparatus comprises a charge neutralizing means for neutralizing charges generated on a surface of the wafer, the charge neutralizing means being mounted in a waiting-accommodation unit which constitutes a part of the conveyer unit, and a charging means for adsorbing particles in the vacuum container unit by electrostatic force, the charging means being mounted in the vacuum container unit. <IMAGE></p> |
