| 发明名称 |
Substrate treating device and method, and exposure device and method |
| 摘要 |
The mask guiding device of the present invention has a mask guiding device that guides a substrate received from the outside. The mask guiding device is provided with a plurality of receiving portions that receives said mask from the outside.
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| 申请公布号 |
US6680775(B1) |
申请公布日期 |
2004.01.20 |
| 申请号 |
US20000671481 |
申请日期 |
2000.09.27 |
| 申请人 |
NIKON CORPORATION |
发明人 |
HIRAKAWA SHINICHI |
| 分类号 |
B65G49/07;G03F7/20;H01L21/677;H01L21/68;(IPC1-7):G03B27/62;G03B27/42;G03D5/00;G06F7/08;B65H1/00 |
主分类号 |
B65G49/07 |
| 代理机构 |
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代理人 |
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