发明名称 |
Dual-wavelength X-ray reflectometry |
摘要 |
A method for testing a surface includes finding respective first and second critical angles for total external reflection of radiation from an area of the surface at first and second wavelengths. The first and second critical angles are compared to determine an orientation of a tangent to the surface in the area.
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申请公布号 |
US6680996(B2) |
申请公布日期 |
2004.01.20 |
申请号 |
US20020078640 |
申请日期 |
2002.02.19 |
申请人 |
JORDAN VALLEY APPLIED RADIATION LTD. |
发明人 |
YOKHIN BORIS;MAZOR ISAAC;GVIRTZMAN AMOS |
分类号 |
G01N23/20;(IPC1-7):G01N23/20 |
主分类号 |
G01N23/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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