| 摘要 |
PURPOSE: An apparatus for inspecting a dark field and a method for fabricating a photo mask using the same are provided to reduce processing errors and enhance the productivity by detecting a defect from the dark field within a short period of time. CONSTITUTION: An apparatus for inspecting a dark field includes a photo mask holder(8), a supporter(12), an absorbing path(11), a stage(10), and a light source(7). A groove is formed at the photo mask holder(8) in order to support a photo mask(6). The supporter(12) is used for supporting the photo mask holder(8). The absorbing path(11) is used for absorbing the photo mask holder(8) by using the high vacuum pressure generated from a center of the supporter(12). The stage(10) is used for supporting the supporter(12). The light source(7) is used for irradiating the light obliquely to an E-beam resist layer deposited on a chrome layer of the photo mask(6).
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