ADJUSTABLE IMPLANTATION ANGLE WORKPIECE SUPPORT STRUCTURE FOR AN ION BEAM IMPLANTER

摘要

An ion beam implanter includes an ion beam source for generating an ion beam (14) moving along a beam line and a vacuum or implantation chamber (22) wherein a workpiece (24) is positioned to intersect the ion beam for ion implantation of a surface (25) of the workpiece by the ion beam. The ion beam implanter further includes a workpiece support structure (100) coupled to the implantation chamber and supporting the workpiece. The workpiece support structure includes a rotation member (110) rotatably affixed to the implantation chamber. Rotation of the rotation member with respect to the implantation chamber changes an implantation angle (A) of the workpiece with respect to the portion of the ion beam beam line within the implantation chamber. The workpiece support structure further includes a translation member movably (150) coupled to the rotation member and supporting the workpiece for linear movement along a path of travel. The translation member moves along a direction of movement such that a distance that the ion beam moves through the implantation chamber remains constant during movement of the workpiece along its path of travel.