发明名称 PHOTO-SETTING RESIN, AND RESIN COMPOSITION AND COATING MATERIAL CONTAINING THE RESIN
摘要 PROBLEM TO BE SOLVED: To provide a low-cost high-molecular-weight photo-setting resin excellent in hardness, marring resistance and solvent resistance, while maintaining adherence and the like, and provide a resin composition containing the photo-setting resin, and a coating material containing the composition. SOLUTION: The photo-setting resin is obtained by copolymerizing an unsaturated compound having one glycidyl group and one polymerizable unsaturated bond with an unsaturated compound having one polymerizable unsaturated bond to give a copolymer (I), subjecting the copolymer (I) to addition reaction with an unsaturated compound having one carboxy group and one polymerizable unsaturated bond to give an acrylic photo-setting resin (II), and reacting the resin (II) with an isocyanate containing a photo-functional group. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004010772(A) 申请公布日期 2004.01.15
申请号 JP20020166915 申请日期 2002.06.07
申请人 HITACHI CHEM CO LTD 发明人 SUGAWARA ATSUSHI;HAMADA KEIJI;KONDO SHUICHI;SUZUKI HIROSHI
分类号 C08F290/04;C08F8/30;C09D4/00;C09D133/00;(IPC1-7):C08F8/30 主分类号 C08F290/04
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