发明名称 EXPOSURE HEAD AND EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To reduce the lowering of the utilization efficiency of a laser beam emitted from a laser emission part and also to expose a face, an object of exposure, by a beam spot having a desired spot diameter and shape. <P>SOLUTION: In an exposure head 166, a microlens array 72 is fitted so that it is in close contact with a light-emitting face 52 of LCD 50. Each microlens 74 in the microlens array 72 condenses the laser beam emitted from a pixel part 62 in the LCD 50. A light source image of the laser emission part 68 formed in the vicinity of the position of the rear-side focus of the microlens 74 is made minute by the lens and projected onto the face 56 to be exposed. The face 56 is exposed with the light source image formed as a beam spot BS. According to this constitution, the size of the light source image projected as the beam spot onto the face 56 can be reduced in comparison with the beam diameter of the laser beam transmitted through each pixel part 62 of the LCD 50. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004009594(A) 申请公布日期 2004.01.15
申请号 JP20020167405 申请日期 2002.06.07
申请人 FUJI PHOTO FILM CO LTD 发明人 OMORI TOSHIHIKO;SUNAKAWA HIROSHI;ISHIKAWA HIROMI;OKAZAKI YOJI;NAGANO KAZUHIKO;FUJII TAKESHI
分类号 B41J2/445;G02B3/00;G02B6/42;G02F1/13;G02F1/1335 主分类号 B41J2/445
代理机构 代理人
主权项
地址