INSPECTION METHOD OF PHOTOMASK AND INSPECTION APPARATUS THEREFOR

摘要

PROBLEM TO BE SOLVED: To decrease a carrying work of a photomask in an inspection process and to easily and rapidly inspect photomasks with different exposure wavelengths by using one simulator.

SOLUTION: The method for inspecting a Levenson type phase shift mask (PSM) having a defect includes a process of scanning the defect and area around the defect on the PSM by using a level difference measuring device to acquire the level difference data and a process of inputting the level difference data and the exposure conditions of the PSM in a three-dimensional electromagnetic field simulator to acquire the intensity distribution data of the light transmitting through the PSM. The intensity distribution data of the light can be acquired without mounting the photomask in the simulator as well as the exposure wavelength can be arbitrarily inputted.

COPYRIGHT: (C)2004,JPO