APPARATUS FOR WASHING RIM PART OF SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a washing apparatus for dissolving and removing a rim part of a square substrate and an unnecessary part of a thin film from the end face of the substrate even if the washing margin of the rim part of the square substrate is wide and even if the thin film on the square substrate is hard to remove. SOLUTION: A plurality of solvent jetting nozzles 18 are arranged in parallel along the rim of a square substrate 1 held by a substrate holding means for dissolving a portion of a thin film on a square substrate 1 in a prescribed width from the rim of the substrate by jetting a solvent from the discharge ports while being moved in the direction parallel to the rim of the substrate and the jetting nozzles 18 are disposed at a second position corresponding to the vicinity of the rim of the square substrate other than a first position corresponding to the boundary of the part of the surface of the square substrate to be coated with the thin film and the part from which the thin film is removed. COPYRIGHT: (C)2004,JPO