Apparatus and method for the formation of thin films

摘要

This thin film-forming apparatus comprises a vacuum chamber 2 for forming a thin film on a target material 5, an evaporation source 3 arranged in the chamber 2 and having an evaporation port 33 through which the vapor of a material 40 to be vapor-deposited passes, and a moving mechanism 20 for moving the source 3 towards the widthwise direction of the port 33 between a prescribed waiting position and film-forming position of the source 3. This apparatus further comprises a film-thickness sensor 50 for detecting a film-forming speed of the material 40, which is arranged in a vicinity of the waiting position of the source 3 and on a side of the material 5. The source 3 is positioned opposite to the sensor 50 at the waiting position and is positioned opposite to the material 5 at the film-forming position.