PLASMA PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of measuring plasma luminescence in a processing chamber stably and accurately for a long period without degrading the transmissivity of a measurement port for measuring the plasma luminescence. SOLUTION: For measuring the emission state of a plasma generated in the apparatus, stable plasma measurement can be realized by installing at least one or more branching pipes on a structure contacting to the plasma and a measurement window 140 at the end of the branching pipe and then preventing pollution on the measurement window 140 when measuring the plasma. The plasma processing apparatus has a mechanism heating a component part in the processing chamber in a vacuum state to an arbitrary temperature with an optical heating source 160 arranged in an atmospheric side. Therein the measurement window 140 capable of improving the accuracy of the results of temperature measurement is provided by preventing stray light from the optical heating source 160 or the entry of light caused by the plasma luminescence in the processing chamber and then eliminating the affect of radiation heat from other than these component parts in the processing chamber. COPYRIGHT: (C)2004,JPO