发明名称 |
Film obtained from silsesquioxane polymer and method of preparing same |
摘要 |
A film obtained by heating a coating of a resin composition at a temperature lower than 300 DEG C but not lower than 40 DEG C in air or in an inert atmosphere. The resin composition includes a hydrosilylated polymer obtained by reacting at least one hydridosilsesquioxane compound of the following formula (1) : (HSiO3/2)n wherein n is an integer of 4-1000, with at least one compound of the following formula (2) R<1> - C IDENTICAL C - R<2> wherein R<1> represents a hydrogen atom, a monovalent organic group or a monovalent organosilicon group and R<2> represents a hydrogen atom or a group of the formula: - (R')q - C IDENTICAL C - R where R' represents a divalent organic group or a divalent organometallic group, R represents a monovalent organic group or a monovalent organosilicon group and q is 0 or 1 with the proviso that when R<1> is a hydrogen atom R<2> is a hydrogen atom. <IMAGE> |
申请公布号 |
EP1247850(A3) |
申请公布日期 |
2004.01.14 |
申请号 |
EP20020251884 |
申请日期 |
2002.03.15 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY |
发明人 |
KOBAYASHI, TOSHIAKI;HAYASHI, TERUYUKI;TANAKA, MASATO;YAMAGUCHI, KOUICHI |
分类号 |
C08J5/00;B29C35/02;B29C39/02;B29K83/00;C08G77/50;C08L83/04;C08L83/05;C08L83/07;C08L83/14;C09D183/07;C09D183/14 |
主分类号 |
C08J5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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