发明名称 |
Method of removing particles and a liquid from a surface of substrate |
摘要 |
The present invention is related to a method of removing particles and a liquid from a surface of a substrate using at least one rotating cleaning pad. The approach, according to the present invention, is a technique wherein a sharp liquid-vapor boundary is created on the surface of the substrate adjacent to the last wetted rotating cleaning pad of a plurality of rotating cleaning pads and particularly between this last wetted rotating cleaning pad and a first edge of the substrate.
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申请公布号 |
US6676765(B2) |
申请公布日期 |
2004.01.13 |
申请号 |
US20010862072 |
申请日期 |
2001.05.21 |
申请人 |
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM |
发明人 |
MERTENS PAUL;MEURIS MARK;HEYNS MARC |
分类号 |
H01L21/00;(IPC1-7):B08B7/00;B08B7/04 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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